Optical Emission Spectroscopy Analysis of Ar/N2 Plasma in Reactive Magnetron Sputtering

Synthesis and characterization of La2NiO4+δ coatings deposited by reactive magnetron sputtering using plasma emission monitoring

Native target chemistry during reactive dc magnetron sputtering studied by ex-situ x-ray photoelectron spectroscopy

We report x-ray photoelectron spectroscopy (XPS) analysis of native Ti target surface chemistry during magnetron sputtering in Ar/N2 atmosphere. To avoid air exposure, the target is capped immediately after sputtering with a few-nm-thick Al overlayers, hence, information about the chemical state of target elements as a function of N2 partial pressure pN2 is preserved. Contrary to previous repor...

Mid-Frequency Dual Magnetron Reactive Co-Sputtering for Deposition of Customized Index Optical Films

Reactive co-sputtering is a means to create films of customized or graded index of refraction. This gives the optical coating designer new options, and enables practical realization of new classes of coatings. Two neighboring targets may be sputtered such that material from both targets and reactive gas are incident on the workpiece, depositing a film consisting of a compound. For example, if o...

AlNXOY THIN FILMS DEPOSITED BY DC REACTIVE MAGNETRON SPUTTERING

AlNxOy thin films were produced by DC reactive magnetron sputtering, using an atmosphere of argon and a reactive gas mixture of nitrogen and oxygen, for a wide range of partial pressures of reactive gas. During the deposition, the discharge current was kept constant and the discharge parameters were monitored. The deposition rate, chemical composition, morphology, structure and electrical resis...

UV- and VIS Filter Coatings by Plasma Assisted Reactive Magnetron Sputtering (PARMS)

The advantage of PARMS for the manufacturing of high performance low loss coatings is demonstrated with UVand VIS band pass filter based on HfO2 respectively Nb2O5 and SiO2.